Fabrication of NiO photoelectrodes by aerosol-assisted chemical vapour deposition (AACVD)

M. A. Mat-Teridi; Asif Ali Tahir; S. Senthilarasu; K. G. U. Wijayantha; M. Y. Sulaiman; N. Ahmad-Ludin; M. A. Ibrahim; K. Sopian

doi:10.1002/pssr.201409056

Fabrication of NiO photoelectrodes by aerosol-assisted chemical vapour deposition (AACVD)

M. A. Mat-Teridi, Asif Ali Tahir, S. Senthilarasu, K. G. U. Wijayantha, M. Y. Sulaiman, N. Ahmad-Ludin, M. A. Ibrahim, K. Sopian

Research output: Contribution to journal › Article › peer-review

Abstract

Nanostructured nickel oxide (NiO) photoelectrodes were fabricated with controlled morphology and texture using single-step aerosol-assisted chemical vapour deposition (AACVD). The durable one-step film fabrication process resulted in highly crystalline columnar structure. Texture controlled films were also fabricated from granular to crystalline columnar morphology by controlling the deposition temperature. The thin film electrodes are highly reproducible and possess an optical bandgap of ∼3.7 eV and exhibit cathodic photocurrent.

Original language	English
Pages (from-to)	982-986
Number of pages	5
Journal	Physica Status Solidi - Rapid Research Letters
Volume	8
Issue number	12
DOIs	https://doi.org/10.1002/pssr.201409056
Publication status	Published - 28 Apr 2014
Externally published	Yes

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title = "Fabrication of NiO photoelectrodes by aerosol-assisted chemical vapour deposition (AACVD)",

abstract = "Nanostructured nickel oxide (NiO) photoelectrodes were fabricated with controlled morphology and texture using single-step aerosol-assisted chemical vapour deposition (AACVD). The durable one-step film fabrication process resulted in highly crystalline columnar structure. Texture controlled films were also fabricated from granular to crystalline columnar morphology by controlling the deposition temperature. The thin film electrodes are highly reproducible and possess an optical bandgap of ∼3.7 eV and exhibit cathodic photocurrent.",

author = "Mat-Teridi, {M. A.} and Tahir, {Asif Ali} and S. Senthilarasu and Wijayantha, {K. G. U.} and Sulaiman, {M. Y.} and N. Ahmad-Ludin and Ibrahim, {M. A.} and K. Sopian",

year = "2014",

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day = "28",

doi = "10.1002/pssr.201409056",

language = "English",

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issn = "1862-6254",

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T1 - Fabrication of NiO photoelectrodes by aerosol-assisted chemical vapour deposition (AACVD)

AU - Mat-Teridi, M. A.

AU - Tahir, Asif Ali

AU - Senthilarasu, S.

AU - Wijayantha, K. G. U.

AU - Sulaiman, M. Y.

AU - Ahmad-Ludin, N.

AU - Ibrahim, M. A.

AU - Sopian, K.

PY - 2014/4/28

Y1 - 2014/4/28

N2 - Nanostructured nickel oxide (NiO) photoelectrodes were fabricated with controlled morphology and texture using single-step aerosol-assisted chemical vapour deposition (AACVD). The durable one-step film fabrication process resulted in highly crystalline columnar structure. Texture controlled films were also fabricated from granular to crystalline columnar morphology by controlling the deposition temperature. The thin film electrodes are highly reproducible and possess an optical bandgap of ∼3.7 eV and exhibit cathodic photocurrent.

AB - Nanostructured nickel oxide (NiO) photoelectrodes were fabricated with controlled morphology and texture using single-step aerosol-assisted chemical vapour deposition (AACVD). The durable one-step film fabrication process resulted in highly crystalline columnar structure. Texture controlled films were also fabricated from granular to crystalline columnar morphology by controlling the deposition temperature. The thin film electrodes are highly reproducible and possess an optical bandgap of ∼3.7 eV and exhibit cathodic photocurrent.

U2 - 10.1002/pssr.201409056

DO - 10.1002/pssr.201409056

M3 - Article

SN - 1862-6254

VL - 8

SP - 982

EP - 986

JO - Physica Status Solidi - Rapid Research Letters

JF - Physica Status Solidi - Rapid Research Letters

IS - 12

ER -

Fabrication of NiO photoelectrodes by aerosol-assisted chemical vapour deposition (AACVD)

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