The utility of chemical vapor deposition of silicon from silane gas as a potential route to interfaces has been investigated on Pd(100) using low-energy electron diffraction and scanning tunneling microscopy. Initial adsorption at room temperature leads to the formation of amorphous palladium silicide/silicon surface layer. Annealing to 650 K after low silane exposure (< 5 L) results in subsurface diffusion of silicon with concomitant ejection of palladium atoms. Some surface silicide features also remain intact. Larger exposures (>5 L) at room temperature, followed by 650 K anneal, result in formation of a crystalline (Formula presented) silicide reconstruction. This palladium silicide phase is thought to be of (Formula presented) stoichiometry.
|Number of pages||7|
|Journal||Physical Review B - Condensed Matter and Materials Physics|
|Publication status||Published - 1 Jan 2000|