Silane adsorption on Pd(100) - a low-temperature RAIRS study

Christopher Ennis, S. A. Morton, L. Sun, S. P. Tear, E. M. McCash

Research output: Contribution to journalArticle

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Abstract

Silane adsorption and reaction on Pd(100) have been investigated between 23-80 K by reflection-absorption infrared spectroscopy (RAIRS). Exposure to a silane/argon mixture at a substrate temperature of 23 K results in physisorbed islands of silane with argon matrix isolated silane in subsequent layers. At a substrate temperature of 70 K the silane forms a uniform physisorbed layer on the surface which undergoes dissociative chemisorption at ~78 K. On Pd(100) a surface stabilised SiH moiety is formed; direct adsorption at 80 K leads to the formation of islands of SiH with overlayers of physisorbed molecular silane. The SiH species is stable to 200 K at which point complete dissociation occurs.

Original languageEnglish
Pages (from-to)217-224
Number of pages8
JournalChemical Physics Letters
Volume304
Issue number3-4
DOIs
Publication statusPublished - 30 Apr 1999

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Silanes
Absorption spectroscopy
silanes
Infrared spectroscopy
absorption spectroscopy
infrared spectroscopy
Adsorption
adsorption
Argon
Temperature
argon
Substrates
Chemisorption
chemisorption
dissociation
temperature
matrices

Cite this

Ennis, Christopher ; Morton, S. A. ; Sun, L. ; Tear, S. P. ; McCash, E. M. / Silane adsorption on Pd(100) - a low-temperature RAIRS study. In: Chemical Physics Letters. 1999 ; Vol. 304, No. 3-4. pp. 217-224.
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Silane adsorption on Pd(100) - a low-temperature RAIRS study. / Ennis, Christopher; Morton, S. A.; Sun, L.; Tear, S. P.; McCash, E. M.

In: Chemical Physics Letters, Vol. 304, No. 3-4, 30.04.1999, p. 217-224.

Research output: Contribution to journalArticle

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