SXR Measurements in INTI PF Operated in Neon to Identify Typical (Normal N) Profile for Shots With Good Yield

Sor Heoh Saw; Rajdeep Singh Rawat; Paul Lee; Alireza Talebitaher; Ali E. Abdou; Perk Lin Chong; Federico Roy; Jalil Ali; Sing Lee

doi:10.1109/TPS.2013.2281333

SXR Measurements in INTI PF Operated in Neon to Identify Typical (Normal N) Profile for Shots With Good Yield

Sor Heoh Saw
, Rajdeep Singh Rawat
, Paul Lee
, Alireza Talebitaher
, Ali E. Abdou
, Perk Lin Chong
, Federico Roy
, Jalil Ali
, Sing Lee

SCEDT Engineering

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	3166-3172
Journal	IEEE Transactions on Plasma Science
Volume	41
Issue number	11
DOIs	https://doi.org/10.1109/TPS.2013.2281333
Publication status	Published - 1 Nov 2013

Access to Document

10.1109/TPS.2013.2281333

http://ieeexplore.ieee.org/document/6612699/

Cite this

@article{343df7fd869e4e0990b75cc637cbf9b4,

title = "SXR Measurements in INTI PF Operated in Neon to Identify Typical (Normal N) Profile for Shots With Good Yield",

author = "Saw, \{Sor Heoh\} and Rawat, \{Rajdeep Singh\} and Paul Lee and Alireza Talebitaher and Abdou, \{Ali E.\} and Chong, \{Perk Lin\} and Federico Roy and Jalil Ali and Sing Lee",

year = "2013",

month = nov,

day = "1",

doi = "10.1109/TPS.2013.2281333",

language = "English",

volume = "41",

pages = "3166--3172",

journal = "IEEE Transactions on Plasma Science",

issn = "0093-3813",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

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T1 - SXR Measurements in INTI PF Operated in Neon to Identify Typical (Normal N) Profile for Shots With Good Yield

AU - Saw, Sor Heoh

AU - Rawat, Rajdeep Singh

AU - Lee, Paul

AU - Talebitaher, Alireza

AU - Abdou, Ali E.

AU - Chong, Perk Lin

AU - Roy, Federico

AU - Ali, Jalil

AU - Lee, Sing

PY - 2013/11/1

Y1 - 2013/11/1

U2 - 10.1109/TPS.2013.2281333

DO - 10.1109/TPS.2013.2281333

M3 - Article

SN - 0093-3813

VL - 41

SP - 3166

EP - 3172

JO - IEEE Transactions on Plasma Science

JF - IEEE Transactions on Plasma Science

IS - 11

ER -